Growth characteristics of carbon nanotubes by plasma enhanced hot filament chemical vapor deposition

被引:31
作者
Han, JH
Moon, BS
Yang, WS
Yoo, JB
Park, CY
机构
[1] Sungkyunkwan Univ, Dept Mat Engn, Jangan Gu, Suwon 440746, South Korea
[2] Sungkyunkwan Univ, Dept Phys, Jangan Gu, Suwon 440746, South Korea
关键词
carbon nanotube; plasma enhanced hot filament vapor phase deposition; nicker layer; FED;
D O I
10.1016/S0257-8972(00)00766-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We successfully obtained vertically aligned multiwalled carbon nanotubes on different nickel-coated substrates by plasma enhanced hot filament chemical vapor deposition at low temperatures below 650 degreesC. Acetylene and ammonia gas were used as the carbon source and a catalyst. The surface roughness of the nickel layer increased as NH3 etching time increased. The diameters of the nanotubes decreased and the density of nanotubes increased as NH3 etching time increased. The diameter of the nanotubes was 30-70 nm. A nickel cap was observed on the top of the grown nanotube and a very thin amorphous-carbon-like layer was found on the nickel cap. The morphology and microstructure of carbon nanotubes were measured using scanning electron microscopy and transmission electron microscopy. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:93 / 97
页数:5
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