Thin films of mesoporous silica: preparation and characterization

被引：46

作者：

Pevzner, S ^{[1
]}

Regev, O ^{[1
]}

Yerushalmi-Rozen, R ^{[1
]}

机构：

[1] Ben Gurion Univ Negev, Dept Chem Engn, IL-84105 Beer Sheva, Israel

来源：

CURRENT OPINION IN COLLOID & INTERFACE SCIENCE | 1999年 / 4卷 / 06期

关键词：

mesoporous; thin films; MCM;

D O I：

10.1016/S1359-0294(00)00018-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetries, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital. (C) 2000 Elsevier Science Ltd. All rights reserved.

引用

页码：420 / 427

页数：8

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