Photo-oxidation of phenoxy resins at long and short wavelengths - II. Mechanisms of formation of photoproducts

被引:52
作者
Rivaton, A [1 ]
Moreau, L [1 ]
Gardette, JL [1 ]
机构
[1] Univ Blaise Pascal, URA CNRS 433, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
关键词
D O I
10.1016/S0141-3910(97)00088-8
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Products resulting from the photo-oxidation of phenoxy resin were identified and reported in the preceding paper; mechanisms that account for formation of the photoproducts are proposed in the present paper. Results show that the dominant photo-oxidative pathway is a photo-induced oxidation implying hydroperoxidation. In the first steps of the oxidation induced by long wavelengths (lambda > 300 nm), the main reactions involve the methylene groups in the alpha position to the ether groups. Photo-unstable hydroperoxides are transformed into phenyl formate end-groups. By contrast, no phenyl formate end-groups have been found under short-wavelength exposure (lambda = 254 nm); it is believed that hydrogen abstraction of hydroperoxides formed in alpha positions to ether is more likely to occur than the anticipated homolysis. (C) 1997 Elsevier Science Limited.
引用
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页码:333 / 339
页数:7
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