Continuous image writer -: a new approach to fast direct writing

被引：3

作者：

Paufler, J ^{[1
]}

Brunn, S ^{[1
]}

Bolle, J ^{[1
]}

Körner, T ^{[1
]}

Baudach, Ä ^{[1
]}

Lindner, R ^{[1
]}

机构：

[1] SENTECH Instruments GmbH, D-12489 Berlin, Germany

来源：

OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2 | 2000年 / 4000卷

关键词：

optical lithography; excimer laser; spatial light modulator; maskmaking; Continuous Image Writer; CIW;

D O I：

10.1117/12.389081

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on the development of a production tool of a new system for fast submicron lithography by optical direct writing. The Continuous Image Writer (CIW) combines the advantages of direct writing by using a programmable mask with the advantages of conventional optical lithography by using the same lithographic processes for image formation in photoresists. The CIW can write faster than conventional direct writers and it is more flexible than wafersteppers or scanners. The CIW is designed for maskless patterning of wafers and substrates down to 0.60 mu m feature size. It reaches a maximum writing speed of 1,250mm(2)/min. Our system uses a Lambda Physik KrF excimer laser as light source. The CIW includes all the components necessary for the fully automated exposure of wafers or substrates including automated substrate handling and alignment.

引用

页码：866 / 873

页数：8