Temperature profile and pressure effect on the growth of silicon nanowires

被引:11
作者
Cheng, SW [1 ]
Cheung, HF
机构
[1] City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
[2] City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
关键词
D O I
10.1063/1.1830683
中图分类号
O59 [应用物理学];
学科分类号
摘要
The excess temperature at the tip of silicon nanowires during their growth is calculated and found to be generally low. Therefore the special adhesive property of the tip cannot be explained by the excess temperature. The effect of surface tension is analyzed and we found that it cannot cause a significant lowering of melting point at the tip. Based on the charge-assisted mechanism proposed earlier by us, we note that charge accumulation at the tip results in a strong negative pressure. We propose that this is the key force driving the nanowire to have only one-dimensional growth. (C) 2004 American Institute of Physics.
引用
收藏
页码:5709 / 5711
页数:3
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