Heat treatment of cathodic arc deposited amorphous hard carbon films

被引：50

作者：

Anders, S

Ager, JW

Pharr, GM

Tsui, TY

Brown, IG

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

[2] Rice Univ, Dept Mat Sci, Houston, TX 77251 USA

[3] Adv Micro Devices Inc, Sunnyvale, CA 94088 USA

来源：

THIN SOLID FILMS | 1997年 / 308卷

关键词：

hard carbon films; cathodic arc deposition; Raman spectroscopy; nanoindentation;

D O I：

10.1016/S0040-6090(97)00385-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Amorphous hard carbon films of varying sp(2)/sp(3) fractions were deposited on Si using filtered cathodic are deposition with pulsed biasing. The films were heat treated in air at temperatures up to 550 degrees C. Raman investigation and nanoindentation were performed to study the modification of the films caused by the heat treatment. It was found that films containing a high sp(3) fraction sustain their hardness for temperatures at least up to 400 degrees C, their structure for temperatures up to 500 degrees C, and show a low rate of material loss during heat treatment. Films containing a low sp(3) fraction graphitize during heat treatment, show changes in structure and hardness, and have a high rate of material loss. (C) 1997 Elsevier Science S.A.

引用

页码：186 / 190

页数：5

共 27 条

[1] EFFECT OF INTRINSIC GROWTH STRESS ON THE RAMAN-SPECTRA OF VACUUM-ARC-DEPOSITED AMORPHOUS-CARBON FILMS [J].