In vitro photochemical damage to DNA, RNA and their bases by an inorganic sunscreen agent on exposure to UVA and UVB radiation

被引:102
作者
Hidaka, H [1 ]
Horikoshi, S
Serpone, N
Knowland, J
机构
[1] Iwaki Meisei Univ, Dept Chem, Tokyo, Japan
[2] Concordia Univ, Dept Chem & Biochem, Montreal, PQ H3G 1M8, Canada
[3] Univ Oxford, Dept Biochem, Oxford OX1 3OU, England
关键词
DNA; in vitro photochemical damage; RNA; TiO(2); UVA; UVB;
D O I
10.1016/S1010-6030(97)00229-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The fate of DNA, RNA and their pyrimidine and purine bases was examined on exposure to WA and UVB radiation in the presence of a physical sunscreen agent (TiO(2), anatase/rutile particles) to assess the potential damage that such an agent may cause on contact with such substrates. DNA and RNA were partially decomposed and the bases were converted to carbon dioxide (nitrogen atoms to ammonia and nitrate ions) in a Pyrex reactor under conditions simulating UVA and UVB sunlight. The physical and chemical damage inflicted on DNA and RNA was also confirmed by scanning electron microscopy and gel permeation chromatography. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:205 / 213
页数:9
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