Generation of subquarter-micron resist structures using optical interference lithography and image reversal

We show that by using interference lithography coupled with image reversal techniques we can generate resist structures ranging from one-dimensional gratings to two-dimensional arrays of posts and holes. These resist structures have high aspect ratios and nearly vertical sidewalls. The structure dimensions are accurately controlled by varying the exposure dose. These structures play critical roles in the generation of subwavelength structured surfaces for optical applications. (C) 1997 American Vacuum Society.