Fine mapping of the schizophrenia susceptibility locus on chromosome 1q22

被引:34
作者
Brzustowicz, LM
Hayter, JE
Hodgkinson, KA
Chow, EWC
Bassett, AS
机构
[1] Rutgers State Univ, Dept Genet, Nelson Biol Labs, Piscataway, NJ 08854 USA
[2] Univ Toronto, Dept Psychiat, Toronto, ON, Canada
[3] Univ Toronto, Ctr Addict & Mental Hlth, Schizophrenia Res Program, Genet Program, Toronto, ON, Canada
[4] Univ Med & Dent New Jersey, New Jersey Med Sch, Dept Psychiat, Newark, NJ 07103 USA
关键词
chromosome mapping; sequence alignment; gene duplication; linkage (genetics); genetic predisposition to disease; lod score;
D O I
10.1159/000070665
中图分类号
Q3 [遗传学];
学科分类号
071007 ; 090102 ;
摘要
Schizophrenia is a serious neuropsychiatric illness estimated to affect approximately 1% of the general population. As part of a genome scan for schizophrenia susceptibility loci, we have previously reported a maximum heterogeneity four-point lod score of 6.50 on chromosome 1q21-22 in a group of 22 medium-sized Canadian families, selected for study because multiple relatives were clinically diagnosed with schizophrenia or schizoaffective disorder. We have now conducted fine mapping of this locus in the same set of individuals using 15 genetic markers spanning an similar to 15-cM interval. Parametric linkage analysis with GENEHUNTER v2.1 and VITESSE v2.0 produced a maximum multipoint heterogeneity lod score of 6.50, with a Zmax-1 support interval of <3 cM, corresponding to similar to 1 Mb. Physical mapping and sequence analysis from this region confirmed the presence of an similar to 81-kb tandem duplication, containing low-affinity IgG receptor genes and heat shock protein genes. The sequences of the two copies of this duplication are similar to 97% identical, which has led to the collapse of the two copies into one in the June 2002 NCB1 Build 30 of the Human Genome. This duplication may be involved in genomic instability, leading to gene deletion, and so presents an intriguing candidate locus for schizophrenia susceptibility. Copyright (C) 2002 S. Karger AG, Basel.
引用
收藏
页码:199 / 209
页数:11
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