Screen printed multicrystalline silicon solar cells with porous silicon antireflection coating
被引:3
作者:
Bilyalov, RR
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机构:
Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, GermanyFraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
Bilyalov, RR
[1
]
Groh, B
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机构:
Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, GermanyFraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
Groh, B
[1
]
Lautenschlager, H
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机构:
Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, GermanyFraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
Lautenschlager, H
[1
]
Schindler, R
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机构:
Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, GermanyFraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
Schindler, R
[1
]
Schomann, F
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机构:
Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, GermanyFraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
Schomann, F
[1
]
机构:
[1] Fraunhofer Inst Solar Energy Syst, ISE, D-79100 Freiburg, Germany
来源:
CONFERENCE RECORD OF THE TWENTY SIXTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 1997
|
1997年
关键词:
D O I:
10.1109/PVSC.1997.654050
中图分类号:
TE [石油、天然气工业];
TK [能源与动力工程];
学科分类号:
0807 ;
0820 ;
摘要:
The successful application of chemically etched porous silicon (PS) as an antireflection coating (ARC) for multicrystalline silicon (me-Si) solar cell is reported. The evaluation of the Si surface after chemical etching by microscopical and optical characterization shows the great potential of PS in ARC application. For the first time the PS ARC was formed by simple chemical etching without any protection on the commercial me-Si solar cells with screen printed contacts. The optimization of the etching parameters results in 12,3% efficiency of 10x10 cm(2) mc-Si solar cell with PS ARC.