Synthesis, Monolayer Formation, Characterization, and Nanometer-Scale Photolithographic Patterning of Conjugated Oligomers Bearing Terminal Thioacetates

被引:10
作者
Barlow, Iain [1 ]
Sun, Shuqing [1 ]
Leggett, Graham J. [1 ]
Turner, Michael [2 ]
机构
[1] Univ Sheffield, Dept Chem, Sheffield S3 7HF, S Yorkshire, England
[2] Univ Manchester, Dept Chem, Manchester M13 9PL, Lancs, England
基金
英国工程与自然科学研究理事会;
关键词
SELF-ASSEMBLED MONOLAYERS; FRICTION FORCE MICROSCOPY; FIELD-EFFECT TRANSISTORS; ORGANIZED MOLECULAR ASSEMBLIES; TIP-SAMPLE INTERACTIONS; NORMAL-ALKANOIC ACIDS; NANOIMPRINT LITHOGRAPHY; SOLVENT ENVIRONMENT; CONTACT MECHANICS; GALLIUM-ARSENIDE;
D O I
10.1021/la9035024
中图分类号
O6 [化学];
学科分类号
070301 [无机化学];
摘要
The synthesis of alpha-thioacetate terminated quaterthiophene and phenylene-thiophene materials, possessing thioacetate, oxetane, and alkyl groups at their omega-termini, is described. After deprotection these molecules were adsorbed onto Au films and the resulting self-assembled monolayers were characterized by X-ray photoelectron spectroscopy (XPS) and friction force microscopy (FFM). FFM indicated that monolayers formed by the dithioacetates had the highest coefficients of friction, followed by the oxetane-terminated adsorbates, with the alkyl-functionalized materials showing the lowest friction coefficients. These data may be understood in terms of differences in molecular packing. The quaterthiophene adsorbates also yielded higher friction coefficients than their phenylene-thiophene counterparts. Micrometer-scale patterns were fabricated by mask-based exposure to 244 nm light, and characterized by FFM. Nanometer-scale patterns were fabricated using near-field exposure and characterized by FFM. The images obtained demonstrated that features of conjugated oligomers with high spatial resolution (59 nm, ca. lambda/4) were achievable.
引用
收藏
页码:4449 / 4458
页数:10
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