Dissociative electron attachment in nanoscale ice films: Thickness and charge trapping effects

被引:77
作者
Simpson, WC
Orlando, TM
Parenteau, L
Nagesha, K
Sanche, L
机构
[1] Pacific NW Lab, WR Wiley Environm Mol Sci Lab, Richland, WA 99352 USA
[2] Univ Sherbrooke, Fac Med, Canadian Med Res Grp Radiat Sci, Sherbrooke, PQ J1K 5N4, Canada
关键词
D O I
10.1063/1.475924
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The yield and kinetic energy (KE) distributions of D- ions produced via dissociative electron attachment (DEA) resonances in nanoscale D2O ice films are collected as a function of film thickness. The B-2(1), (2)A(1), and B-2(2) DEA resonances shift to higher energies and their D- ion yields first increase and then decrease as the D2O films thicken. The D- KE distributions also shift to higher energy with increasing film thickness. We interpret the changes in the DEA yield and the D- KE distributions in terms of modifications in the electronic and geometric structure of the surface of the film as it thickens. A small amount of charge build-up occurs following prolonged electron beam exposure at certain energies, which primarily affects the D- KE distributions. Charge trapping measurements indicate that an enhancement in the trapping cross section occurs at energies near zero and between 6 and 10 eV. (C) 1998 American Institute of Physics.
引用
收藏
页码:5027 / 5034
页数:8
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