Surface properties of platinum thin films as a function of plasma treatment conditions

被引:65
作者
Li, ZY [1 ]
Beck, P [1 ]
Ohlberg, DAA [1 ]
Stewart, DR [1 ]
Williams, RS [1 ]
机构
[1] Hewlett Packard Labs, Palo Alto, CA 94304 USA
关键词
platinum; metallic films; plasma processing; X-ray photoelectron spectroscopy; surface structure; morphology; roughness; and topography; atomic force microscopy;
D O I
10.1016/S0039-6028(03)00015-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We examined the surface properties of platinum (Pt) thin films exposed to oxygen and argon plasma treatments and compared them to as-deposited Pt films. The surface wetting properties, refractive index and extinction coefficient of the Pt films were monitored as a function of time after different plasma treatments. Surfaces treated with an oxygen plasma were dramatically different from as-deposited Pt, whereas argon plasma treated surfaces were similar to as-deposited films. X-ray photoelectron spectroscopy confirmed the formation of platinum oxide on films treated with an oxygen plasma, while such oxide diminished after argon plasma treatment. Surface morphology studied with atomic force microscopy indicated a strong dependence of the surface roughness of the Pt films on the power and duration of the argon plasma used for the treatment. Based on these studies, an oxygen plasma treatment followed by a brief low-power argon plasma etch was developed for the purpose of regenerating clean and metallic Pt surfaces, and at the same time providing the smoothest possible surface morphology. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:410 / 418
页数:9
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