The five favored backbone conformations of n-Si4Et10:: cisoid, gauche, ortho, deviant, and transoid

被引:29
作者
Fogarty, HA [1 ]
Ottosson, CH [1 ]
Michl, J [1 ]
机构
[1] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA
来源
JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM | 2000年 / 506卷
关键词
n-Si4Et10; peralkylated polysilanes; backbone conformations; deviant; cisoid;
D O I
10.1016/S0166-1280(00)00416-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Low-energy conformations of n-Si4Et10 (1) and a few simpler medals (2-8) have been examined by geometry optimization at the HF/6-31G* level, and MP2/6-31G* single-point energies have been obtained. Five clans of favored backbone conformations of 1, with SiSiSiSi dihedral angles of similar to+/-40 degrees (C+/-, cisoid), similar to+/-60 degrees (G(+/-), gauche), similar to+/-90 degrees (O+/-, ortho), similar to+/-145 degrees (D+/- deviant), and similar to+/-165 degrees (T+/- transoid), have been identified. Each contains numerous families characterized by terminal group Et3Si conformations, with ag(+)g(+) and ag(+)g(-) particularly advantageous. Each family contains a large number of conformers differing by internal Et2Si conformations, with g(+/-)g(+/-)/g(+/-)g(+/-) and ag(+/-)/ag(+/-) usually energetically the lowest. A simple rationalization is provided for the existence of the C+/- and D+/- conformations which do not occur in the permethglated oligosilanes, and implications for the conformational analysis of peralkylated polysilanes are noted. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:243 / 255
页数:13
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