Polymeric optical waveguides using direct ultraviolet photolithography process

被引:133
作者
Tung, KK [1 ]
Wong, WH [1 ]
Pun, EYB [1 ]
机构
[1] City Univ Hong Kong, Dept Elect Engn, Kowloon, Hong Kong, Peoples R China
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2005年 / 80卷 / 03期
关键词
D O I
10.1007/s00339-003-2248-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Single-mode polymeric channel waveguides were fabricated using simple direct ultraviolet photolithography process. A cross-linkable negative tone epoxy NANO(TM) SU-8 2000 polymer was used. Once exposed to ultraviolet light through a photomask, the waveguide stripes were obtained upon development. The polymer has many desirable properties, such as high refractive index, good adhesion to substrate, optical transparency in the infrared wavelength region, and high glass transition and high thermal decomposition temperatures. Properties of the optical waveguides were characterized, and there is an excellent agreement between measured data and theory. The values of dn/dT and waveguide birefringence are - 1.87 x 10(-4) /degreesC and similar to 10(-4), respectively, and are comparable to those of halogenated acrylate polymers. With an overcladding layer, the propagation losses measured are 0.25 and 0.28 dB/cm at 0.8 mum, 0.62 and 0.77 dB/cm at 1.31 mum, and 1.25 and 1.71 dB/cm at 1.55 mum for TE and TM polarizations, respectively.
引用
收藏
页码:621 / 626
页数:6
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