Effect of ultra-clean sputtering on magnetoresistance and thermal stability of magnetoresistance in spin-valves

被引：3

作者：

Hayashi, K ^{[1
]}

Nakada, M

Kamijo, A

Fujikata, J

Yamada, K

机构：

[1] NEC Corp Ltd, Funct Devices Res Labs, Fuchu, Tokyo 183, Japan

[2] NEC Corp Ltd, Fundamental Res Labs, Kawasaki, Kanagawa 216, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1998年 / 37卷 / 4A期

关键词：

ultra-clean sputtering; spin-valve; base pressure; magnetoresistance; thermal stability;

D O I：

10.1143/JJAP.37.L386

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The influence of the base pressure (8.6 x 10(-10)-1.3 x 10(-7) Torr) in the sputtering chamber just before the deposition on the magnetoresistance (MR) ratios and the thermal stability of the MR ratios in spin-valves (SVs) was studied, using purified sputtering Ar gas (impurity level less than 1 ppb). The resistivity rho in the SVs decreased and as a result, the MR ratio increased with decreasing base pressure. Also, the thermal stability of the MR ratio was improved with decreasing base pressure. The increase of grain size in the SVs fabricated under low base pressures bears a close relationship to the MR ratios and the thermal stability of the MR ratios.

引用

页码：L386 / L389

页数：4

共 8 条

[1] Underlayer effect on magneto-resistance in spin-valves [J].

Hayashi, K ;

Mori, S ;

Yamamoto, H ;

Fujikata, J ;

Nakada, M ;

Yamada, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (9AB) :L1161-L1164

[2] Effect of surface cleanness on the magnetic properties of CoNiCr and CoCrTa thin-film media fabricated using an ultraclean sputtering process [J].

Kawakita, S ;

Sakurai, T ;

Kikuchi, A ;

Shimatsu, T ;

Takahashi, M .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1996, 155 (1-3) :172-175

[3] THE ROLE OF INTERFACES IN NIFE/CU/NIFE SPIN VALVES [J].

NOZIERES, JP ;

SPERIOSU, VS ;

GURNEY, BA ;

DIENY, B ;

LEFAKIS, H ;

HUANG, TC .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1993, 121 (1-3) :386-389

[4]

SAITO AT, 1998, 7 JOINT MMM INT C, P61

[5] HIGH COERCIVE FORCE AND LOW INTERGRANULAR COUPLING IN THIN-FILM MEDIA FABRICATED UNDER THE ULTRA CLEAN SPUTTERING PROCESS [J].

SHIMATSU, T ;

TAKAHASHI, M .

MATERIALS CHEMISTRY AND PHYSICS, 1995, 41 (02) :134-140

[6]

SUGAWARA N, 1997, 21 ANN C MAGN J, V21, P42

[7] MAGNETIZATION REVERSAL MECHANISM EVALUATED BY ROTATIONAL HYSTERESIS LOSS ANALYSIS FOR THE THIN-FILM MEDIA [J].

TAKAHASHI, M ;

SHIMATSU, T ;

SUEKANE, M ;

MIYAMURA, M ;

YAMAGUCHI, K ;

YAMASAKI, H .

IEEE TRANSACTIONS ON MAGNETICS, 1992, 28 (05) :3285-3287

[8]

TSUNODA M, 1998, IN PRESS J MAGN MAGN

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