Comparison of acrylate and methacrylate resin system in ArF lithography

被引：8

作者：

Uetani, Y ^{[1
]}

Fujishima, H ^{[1
]}

机构：

[1] Sumitomo Chem Co Ltd, Fine Chem Res Lab, Konohana Ku, Osaka 5548558, Japan

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷

关键词：

ArF; 2MAdMA; 2MAdAA; GBLMA; GBLAA; methacrylate; acrylate;

D O I：

10.1117/12.388260

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Using 2MAdMA(2-Metyl-2-Adamantylmethacrylate), 2MAdAA(2-Metyl-2-Adamantylacrylate), GBLMA( gamma - butyrolactone methacrylate), GBLAA(gamma -butyrolactone acrylate) monomers, 4 types of copolymers, 2MAdMA/GBLMA, 2MAdMA/GBLAA, 2MAdAA/GBLMA, 2MAdAA/GBLAA resins were prepared. The same PAG formulation was applied to these resins to make ArF resist samples. Resolution capability, dry-etching resistance were evaluated. From the result, It can be concluded that 2MAdAA/GBLMA resin system has the best balance in dry etching resistance, resolution and sensitivity.

引用

页码：974 / 979

页数：4