Fabrication of 1 μm patterns on fused silica plates by laser-induced backside wet etching (LIBWE)

被引：10

作者：

Ding, XM ^{[1
]}

Kawaguchi, Y ^{[1
]}

Niino, H ^{[1
]}

Yabe, A ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, AIST, Tsukuba, Ibaraki 3058565, Japan

来源：

THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 4830卷

关键词：

laser ablation; excimer laser; fused silica; naphthalene derivative; pyranine; aqueous solution;

D O I：

10.1117/12.486571

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Laser-induced backside wet etching of fused silica plates using aqueous solutions of naphthalene-1,3,6-trisulfonic acid trisodium salt (Np) and pyranine (Py) was performed upon KrF excimer laser irradiation at 248 nm. The two etching media show different etching behavior with changing laser fluence and medium concentrations. Well-defined line-and-space and grid micropatterns at 1 mum scale were fabricated using an aqueous solution of Np and the etched pattern was free of debris and microcracks.

引用

页码：156 / 161

页数：6

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