Ab initio study of metal gate electrode work function

被引：68

作者：

Park, S ^{[1
]}

Colombo, L

Nishi, Y

Cho, K

机构：

[1] Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA

[2] Texas Instruments Inc, Dallas, TX 75265 USA

[3] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 07期

关键词：

D O I：

10.1063/1.1865349

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The work function of metal multilayers and monolayers on bulk metals was studied using the first principle pseudopotential method within the local density approximation in order to find a way to modulate the work function of metal gate electrodes. Various multilayer stacks and bilayer stacks of two systems, Al-Pt and Al-Ni, were examined. It was found that-two or three layers of the metal are enough to shift the work function to that of the surface metal. Also, it was found that even a submonolayer could affect the work function of the bulk metal significantly. (C) 2005 American Institute of Physics.

引用

页码：1 / 3

页数：3

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