Morphological and structural characterizations of dendrimer-mediated metallic Ti and Al thin film nanocomposites

被引：6

作者：

Curry, M.

Li, X.

Zhang, J.

Weaver, M. L.

Street, S. C. ^{[1
]}

机构：

[1] Univ Alabama, Ctr Mat Informat Technol, Tuscaloosa, AL 35487 USA

[2] Univ Alabama, Dept Chem, Tuscaloosa, AL 35487 USA

[3] Univ Alabama, Dept Met Engn & Mat Sci, Tuscaloosa, AL 35487 USA

来源：

THIN SOLID FILMS | 2007年 / 515卷 / 7-8期

基金：

美国国家科学基金会;

关键词：

dendrimer nanocomposites; ultrathin metal films; XPS; AFM;

D O I：

10.1016/j.tsf.2006.11.018

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Evidence is presented here for significant influence on the surface topography of Ti and Al films in the presence of poly(amidoamine) dendrimer monolayers [generations G(4-8)] on SiOx. X-ray photoelectron spectroscopy analysis clearly indicates formation of nitrides and carbides for Ti metal grown on dendrimer monolayers. In addition, obvious trends in measured correlation lengths and crystalline growth modes of Ti films indicate grain sizes tracking the intrinsic roughness of dendrimer monolayers. No formation of metal nitride is observed for Al depositions. Atomic force microscopy analyses show significant changes in rms vertical roughness and aggregation of as-deposited Ti or Al in presence of dendrimer monolayers. (c) 2006 Elsevier B.V. All rights reserved.

引用

收藏

页码：3567 / 3573

页数：7

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