Surface roughness of (110) orientation silicon based micro heat exchanger channel

被引：16

作者：

Kang, SW ^{[1
]}

Chen, JS ^{[1
]}

Hung, JY ^{[1
]}

机构：

[1] Tamkang Univ, Dept Mech Engn, Tamsui 25137, Taipei, Taiwan

来源：

INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE | 1998年 / 38卷 / 5-6期

关键词：

D O I：

10.1016/S0890-6955(97)00115-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Using microfabrication techniques, we can etch large numbers of small size, high precision channels into (110)-oriented silicon with KOH to construct extremely efficient micro heat exchanger. In this paper, the micro channel surface roughness are investigated as a function of the solution temperature and concentration. The results presented here are intended to provide help in the selection of etch parameter for silicon. (C) 1998 Elsevier Science Ltd.

引用

页码：663 / 668

页数：6

共 4 条

[1] SILICON ANISOTROPIC ETCHING IN KOH-ISOPROPANOL ETCHANT [J].