CMOS with active well bias for low-power and RF/analog applications

被引:32
作者
Wann, C [1 ]
Harrington, J [1 ]
Mih, R [1 ]
Biesemans, S [1 ]
Han, K [1 ]
Dennard, R [1 ]
Prigge, O [1 ]
Lin, C [1 ]
Mahnkopf, R [1 ]
Chen, B [1 ]
机构
[1] IBM Semicond Res & Dev Ctr, Hopewell Junction, NY 12533 USA
来源
2000 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS | 2000年
关键词
D O I
10.1109/VLSIT.2000.852808
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
We show that with a forward body bias, CMOS performance can be improved for those applications which are primarily concerned with speed, and for those which have fixed performance targets but desire lower switching energy (higher MHz/mW). Thus V-t can be set according to standby power requirement or device design (well and halo engineering), forward body bias is then applied to improve speed or to reduce active power. No compromise in I-off results if the forward bias is applied when the circuits are active, during which time I-off and the leakage current are small compared to the switching current. Therefore a low-power CMOS strategy should use a MOSFET as a four-terminal device with a fast top gate and a slow bottom gate shared by a block. Deep-trench isolation with STI provides fine-grain isolation for body bias blocks without area penalty. Making the body available also improves the device analog properties and enables new applications. We present an active well VCO/mixer as an example.
引用
收藏
页码:158 / 159
页数:2
相关论文
共 9 条
[1]  
ANDOH T, 1994, INTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGEST, P79, DOI 10.1109/IEDM.1994.383462
[2]  
ASSADERAGHI F, 1994, INTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGEST, P809, DOI 10.1109/IEDM.1994.383301
[3]  
Chen ZJ, 1995, INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST, P63, DOI 10.1109/IEDM.1995.497183
[4]  
SHIBATA A, 1998, VLSI S, P77
[5]  
SU L, 1996, VLSI S, P13
[6]  
THOMPSON S, 1997, VLSI S, P69
[7]   Channel profile optimization and device design for low-power high-performance dynamic-threshold MOSFET [J].
Wann, C ;
Assaderaghi, F ;
Dennard, R ;
Hu, CM ;
Shahidi, G ;
Taur, Y .
IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996, 1996, :113-116
[8]  
WANN C, 1998, IEEE INT SOL STAT CI, P254
[9]  
Yang IY, 1995, INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST, P877, DOI 10.1109/IEDM.1995.499356