Depth profiling of W, O and H in tungsten trioxide thin films using RBS and ERDA techniques

被引:24
作者
Bohnke, O
Frand, G
Fromm, M
Weber, J
Greim, O
机构
[1] UNIV NEUCHATEL,INST PHYS,CH-2000 NEUCHATEL,SWITZERLAND
[2] UNIV FRANCHE COMTE,LAB MICROANAL NUCL,F-25030 BESANCON,FRANCE
关键词
D O I
10.1016/0169-4332(95)00173-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Tungsten trioxide thin films obtained by vacuum evaporation of tungsten oxide powder of high purity were analyzed using Rutherford backscattering spectroscopy (RES) and elastic recoil detection analysis (ERDA) with He-4(+) ions of 2.85 MeV for W, O and H profiling. The films have been deposited onto either C or Si substrates. It has been found that the film stoichiometry depends on the pressure in the vacuum chamber before and during the evaporation process. The films contain water molecules which can be removed easily by heating the samples up to 180 degrees C: in vacuum. Most of the water is then weakly bound to the oxide. It has also been shown that the films mostly adsorb oxygen-containing species during storage in air.
引用
收藏
页码:45 / 52
页数:8
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