Perpendicular magnetic anisotropy in sputtered amorphous TbFeCo films

被引：10

作者：

Liu, X. ^{[1
]}

Morisako, A.

Sakurai, H.

Sakurai, Y.

Itou, M.

Koizumi, A.

机构：

[1] Shinshu Univ, Ctr Spin Device Technol, Wakasato, Nagano 3808553, Japan

[2] Gunma Univ, Dept Elect Engn, Kiryu, Gunma 3768515, Japan

[3] Japan Synchrotron Radiat Res Inst, Hyogo 6795198, Japan

[4] Univ Hyogo, Dept Mat Sci, Chuo Univ, Kobe, Hyogo, Japan

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2007年 / 310卷 / 02期

关键词：

magnetic anisotropy; amorphous TbFeCo film;

D O I：

10.1016/j.jmmm.2006.10.576

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Local chemical bonding and magnetic Compton profiles were used to study the origination of perpendicular magnetic anisotropy (PMA) in amorphous TbFeCo films. Experimental results suggested oxygen atoms can change the local chemical bonding. Anisotropic chemical bonding of Fe3d and Tb4f electrons are found for films with suitable oxygen composition. It is concluded that the origination of PMA in amorphous TbFeCo films is related to the composition of oxygen atoms in the films. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：1744 / 1746

页数：3

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