Fabrication and optimization of uniform output couplers for far-infrared lasers

被引:3
作者
Bailey, WA [1 ]
Gatesman, AJ
Gingras, KR
Goodhue, WD
机构
[1] Univ Massachusetts, Photon & Optoelect Devices Fabricat Lab, Lowell, MA 01854 USA
[2] Univ Massachusetts, Submillimeter Wave Technol Lab, Lowell, MA 01854 USA
关键词
D O I
10.1364/OL.25.001349
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
An improved technique for the fabrication of uniform output couplers for far-infrared lasers has been developed. The technique includes a process for uniformly removing material from the back side of the coupler's substrate to tune the coupler's reflectivity precisely to the specified value for a particular laser line. Depending on the condition of the coupler after use, it can be retuned to another laser line, which lies within the coupler's reflectance envelope. Furthermore, when there is the possibility of lasing at two different laser wavelengths (as happens with some far-infrared lasers), it is possible to optimize the coupler for one wavelength while at the same time detuning the other wavelength. The fabrication and optimization of these devices are discussed. (C) 2000 Optical Society of America.
引用
收藏
页码:1349 / 1351
页数:3
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