Contact angle, gas bubble detachment, and surface roughness in the anisotropic dissolution of Si(100) in aqueous KOH

被引：36

作者：

Baum, T ^{[1
]}

Satherley, J ^{[1
]}

Schiffrin, DJ ^{[1
]}

机构：

[1] Univ Liverpool, Dept Chem, Liverpool L69 7ZD, Merseyside, England

来源：

LANGMUIR | 1998年 / 14卷 / 10期

关键词：

D O I：

10.1021/la9711950

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：2925 / 2928

页数：4

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