Switching stability of magnetic tunnel junctions with an artificial antiferromagnet

被引:16
作者
Schmalhorst, J
Brückl, H
Reiss, G
Kinder, R
Gieres, G
Wecker, J
机构
[1] Univ Bielefeld, Fac Phys, Nano Device Grp, D-33501 Bielefeld, Germany
[2] Siemens AG, Zent Tech ZT MFI, D-91050 Erlangen, Germany
关键词
D O I
10.1063/1.1327272
中图分类号
O59 [应用物理学];
学科分类号
摘要
Avoiding fatigue in the switching of magnetic tunnel junctions is crucial for their long-term use in nonvolatile magnetic memories. We compare the switching stability of two types of junctions with different soft layers: Fe or Ni81Fe19, both with Co dusting at the barrier interface. The magnetically hard electrode is a Co/Cu/Co artificial antiferromagnet. While the tunneling magnetoresistance (TMR) remains unchanged after 10(4) cycles in a 4 kA/m rotating field, it decreases by more than 45% due to uniaxial switching. Fringing fields of domain walls in the soft layer and an intrinsic instability of Co/Cu/Co are identified as the main reasons. Magnetization reversal by two perpendicular switching pulses avoids this magnetic degradation and maintains a full TMR signal. (C) 2000 American Institute of Physics. [S0003-6951(00)01447-9].
引用
收藏
页码:3456 / 3458
页数:3
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