Zirconia thick films deposited on nickel by aqueous electrophoretic deposition

被引:47
作者
Ferrari, B [1 ]
Moreno, R [1 ]
机构
[1] CSIC, Inst Ceram & Vidrio, Madrid 28500, Spain
关键词
D O I
10.1149/1.1393636
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electrophoretic deposition (EPD) is a powerful route to obtain thick coatings onto conductive substrates, The system ZrO2/Ni is widely considered for technological applications, such as solid-oxide fuel cells. EPD is usually performed using nonaqueous suspensions in which problems related to electrolysis are avoided. However, the possibility for using aqueous systems is receiving an increased interest due to economical and ecological benefits. In this work, the processing conditions for obtaining ZrO2 deposits from aqueous suspensions are studied. The dispersing characteristics of the slips are studied in terms of zeta potential and conductivity. The kinetics of the process is analyzed for optimized dispersing conditions considering the deposited mass and thickness. Deviations in current density and powder concentration are considered the two reasons that deposition kinetics can deviate from linear Hamaker growth. In his work, both parameters have been controlled, but deviations from linearity still occur. Hence, other parameters not considered in the literature are affecting the aqueous EPD kinetics. (C) 2000 The Electrochemical Society. S0013-4651(00)02-018-8. All rights reserved.
引用
收藏
页码:2987 / 2992
页数:6
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