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In-situ TEM tensile testing of DC magnetron sputtered and pulsed laser deposited Ni thin films

被引：195
作者：
Hugo, RC
Kung, H
Weertman, JR
Mitra, R
Knapp, JA
Follstaedt, DM
机构：
[1] Los Alamos Natl Lab, MST 8 Struct Properties Grp, Los Alamos, NM 87545 USA
[2] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[3] Def Met Res Lab, Hyderabad 500258, Andhra Pradesh, India
[4] Sandia Natl Labs, Phys & Chem Sci Ctr, Albuquerque, NM 87185 USA
来源：
ACTA MATERIALIA | 2003年 / 51卷 / 07期
基金：
美国能源部;
关键词：
D O I：
10.1016/S1359-6454(02)00599-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Two nanocrystalline Ni thin films, one prepared via DC Magnetron Sputtering and the other prepared via Pulsed Laser Deposition, were strained in-situ in the Transmission Electron Microscope. Although the grain sizes were similar, the two films behaved quite differently in tension. The sputtered material was found to behave in a brittle manner, with failure occurring via rapid coalescence of intergranular cracks. Conversely, the laser deposited film behaved in a ductile manner, with failure occurring by slow ductile crack growth. The difference in failure mechanism was attributed to the presence of grain boundary porosity in the sputtered thin film. Both films exhibited pervasive dislocation motion before failure, and showed no conclusive evidence of a change in deformation mode. Published by Elsevier Science Ltd on behalf of Acta Materialia Inc.
引用
收藏
页码：1937 / 1943
页数：7
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