Crystal-orientation controlled PZT FeRAM-capacitors using rf magnetron sputtering with 12"φ single target

被引:11
作者
Inoue, N [1 ]
Maejima, Y [1 ]
Hayashi, Y [1 ]
机构
[1] NEC Corp Ltd, ULSI Res Lab, Silicon Syst Res Labs, Kanagawa 22911, Japan
来源
INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST | 1997年
关键词
D O I
10.1109/IEDM.1997.650457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Crystal-orientation control of a PZT is very important to obtain a ferroelectric capacitor with large remnant polarization. Perovskite PZT film with {100}-orientation, parallel to the polarization axis, is obtained by RF-sputtering and 600 degrees C-annealing. A metastable pyrochlore film, sputtered around 500 degrees C, is transformed to the crystal-orientated perovskite PZT film (stable phase). The PZT capacitor has large remnant polarization of 2P(r)=28 mu C/cm(2). The small capacitor, sized fi om 2 mu m square to 100 mu m square, keeps superior characteristics after Al-metallization, being applicable to a high density FeRAM memory cell.
引用
收藏
页码:605 / 608
页数:4
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