Quantum size effect induced modification of the chemisorption properties of thin metal films

被引:38
作者
Danese, AG
Curti, FG
Bartynski, RA
机构
[1] Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08855 USA
[2] Rutgers State Univ, Surface Modificat Lab, Piscataway, NJ 08855 USA
来源
PHYSICAL REVIEW B | 2004年 / 70卷 / 16期
关键词
D O I
10.1103/PhysRevB.70.165420
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present temperature programmed desorption data and inverse photoemission (IPE) spectra that directly demonstrate the effects of quantum confinement of electrons in an ultrathin metal film on molecular chemisorption at the film's surface. The prototypical system of CO adsorbed on the n-monolayers-Cu/fccFe/Cu(100) [2<n<15] was explored. For all films, the CO peak desorption temperature (T-des) is lower than that of Cu(100). Moreover, oscillations in T-des are correlated with oscillations in the IPE intensity at the Fermi level (E-F) caused by metallic quantum well states in the Cu overlayer passing through E-F as function of film thickness.
引用
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页码:1 / 5
页数:5
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