Oxygen active species in an Ar-O2 magnetron discharge for titanium oxide deposition

被引:16
作者
Vancoppenolle, V
Jouan, PY
Ricard, A
Wautelet, M
Dauchot, JP
Hecq, M
机构
[1] Univ Valenciennes, LAMAC, F-59600 Maubeuge, France
[2] Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, Belgium
[3] Univ Toulouse 3, CPAT, F-31062 Toulouse, France
关键词
magnetron plasma; optical emission spectroscopy; TiO2; thin films;
D O I
10.1016/S0169-4332(02)01085-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Emission spectroscopy of an Ar-O-2 dc magnetron sputtering plasma has been performed at 3.5 cm above a Ti target. The behavior of O-2(+) and O have been studied by introducing O-2 into the Ar plasma. The vibrational distributions of O-2(+) (b) radiative state have been determined. It is found to exhibit a quasi-Boltzmann distribution with vibrational temperatures between 2500 and 3500 K for discharge current between 200 and 500 mA at 5 mTorr. By comparing intensities of O and O-2(+) by emission spectroscopy and O-2(+) relative density by mass spectroscopy, the O/O-2 relative dissociation rate is found to be followed by the I-O/IO2+ optical intensity ratio. It is found to have an increase of n(O)/n(O2) with the discharge current. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:249 / 255
页数:7
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