On the development of texture during growth of magnetron-sputtered CrN

被引:45
作者
Schell, N
Petersen, JH
Bottiger, J
Mücklich, A
Chevallier, J
Andreasen, KP
Eichhorn, F
机构
[1] Rossendorf Inc, Forschungszentrum Rossendorf EV, D-01314 Dresden, Germany
[2] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
关键词
texture development; CrN; magnetron sputtering;
D O I
10.1016/S0040-6090(02)01142-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
During growth of CrN films deposited by reactive magnetron sputtering, the development of the microstructure, especially the texture, was studied. By ex-situ Bragg-Brentano X-ray diffraction measurements, the texture, the grain size and the microstrain were measured as a function of film thickness. In addition, in-situ Bragg-Brentano X-ray diffraction and reflection measurements were carried out with synchrotron radiation, including measurements where the dynamic development of the microstructure was followed in real-time. Below a transition deposition temperature of approximately 550 degreesC, it was found that the <0 0 2> preferred orientation dominated, while a mixture of <1 1 1> and <0 0 2> preferred orientations was found above the transition temperature. The development of texture with film thickness was controlled by a recrystallization mechanism. With increasing film thickness, the grain size increased while the microstrain decreased. The real-time measurements with synchrotron radiation revealed that several different dynamic processes took place both during and after depositions. After a long-time interruption of the growth, major changes in the texture were observed. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:100 / 110
页数:11
相关论文
共 17 条
[1]   EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].
ADIBI, F ;
PETROV, I ;
GREENE, JE ;
HULTMAN, L ;
SUNDGREN, JE .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8580-8589
[2]   Microstructure of CrN coatings produced by PVD techniques [J].
Cunha, L ;
Andritschky, M ;
Pischow, K ;
Wang, Z .
THIN SOLID FILMS, 1999, 355 :465-471
[3]  
EDELSTEIN AS, 1998, NANOMATERIALS
[4]  
HOLMBERG K, 1994, COATINGS TRIBOLOGY
[5]   Influence of ion bombardment on structure and properties of unbalanced magnetron grown CrNx coatings [J].
Hurkmans, T ;
Lewis, DB ;
Paritong, H ;
Brooks, JS ;
Münz, WD .
SURFACE & COATINGS TECHNOLOGY, 1999, 114 (01) :52-59
[6]   Preferred orientation of TiN films studied by a real time synchrotron x-ray scattering [J].
Je, JH ;
Noh, DY ;
Kim, HK ;
Liang, KS .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (09) :6126-6133
[7]  
KOBAYASHI M, 1984, THIN SOLID FILMS, V111, P259
[8]  
LEAVITT JA, 1995, HDB MODERN ION BEAM, pCH4
[9]   ROBL -: a CRG beamline for radiochemistry and materials research at the ESRF [J].
Matz, W ;
Schell, N ;
Bernhard, G ;
Prokert, F ;
Reich, T ;
Claussner, J ;
Oehme, W ;
Schlenk, R ;
Dienel, S ;
Funke, H ;
Eichhorn, F ;
Betzl, M ;
Pröhl, D ;
Strauch, U ;
Hüttig, G ;
Krug, H ;
Neumann, W ;
Brendler, V ;
Reichel, P ;
Denecke, MA ;
Nitsche, H .
JOURNAL OF SYNCHROTRON RADIATION, 1999, 6 :1076-1085
[10]   A two magnetron sputter deposition chamber for in situ observation of thin film growth by synchrotron radiation scattering [J].
Matz, W ;
Schell, N ;
Neumann, W ;
Bottiger, J ;
Chevallier, J .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2001, 72 (08) :3344-3348