Fabrication of high-magnetoresistance tunnel junctions using Co75Fe25 ferromagnetic electrodes

被引:112
作者
Han, XF [1 ]
Oogane, M [1 ]
Kubota, H [1 ]
Ando, Y [1 ]
Miyazaki, T [1 ]
机构
[1] Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Sendai, Miyagi 9808579, Japan
关键词
D O I
10.1063/1.126951
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temperature dependence of tunnel magnetoresistance (TMR) ratio, resistance, and coercivity from 4.2 K to room temperature and applied voltage dependence of the TMR ratio and resistance at room temperature for a tunnel junction, Ta (5 nm)/Ni79Fe21 (3 nm)/Cu (20 nm)/Ni79Fe21 (3 nm)/Ir22Mn78 (10 nm)/Co75Fe25 (4 nm)/Al (0.8 nm)-oxide/Co75Fe25 (4 nm)/Ni79Fe21 (20 nm)/Ta(5 nm), were investigated. TMR ratio, effective barrier height and width, and breakdown voltage of the junction can be remarkably enhanced after annealing at 300 degrees C for an hour. High TMR ratio of 49.7% at room temperature and 69.1% at 4.2 K were observed. The value of spin polarization of Co75Fe25, P = 50.7%, deduced from the TMR ratio at 4.2 K was corresponding well to the experimental data measured at 0.2 K in a spin polarized tunneling experiment using a superconductor/insulator/ferromagnet tunneling junction. (C) 2000 American Institute of Physics. [S0003-6951(00)05028-2].
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收藏
页码:283 / 285
页数:3
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