Systematic study of the effect of disorder on nanotribology of self-assembled monolayers

被引:71
作者
Chandross, M
Webb, EB
Stevens, MJ
Grest, GS
Garofalini, SH
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
[2] Rutgers State Univ, Dept Ceram & Mat Engn, Piscataway, NJ 08854 USA
关键词
D O I
10.1103/PhysRevLett.93.166103
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The adhesion and friction between pairs of ordered and disordered self-assembled monolayers on SiO2 are studied using molecular dynamics. The disorder is introduced by randomly removing chains from a well ordered crystalline substrate and by attaching chains to an amorphous substrate. The adhesion force between monolayers at a given separation increases monotonically with chain length at full coverage and with coverage for fixed chain length. Friction simulations are performed at shear velocities between 0.02-2 m/s at constant applied pressures between 200 and 600 MPa. Stick-slip motion is observed at full coverage but disappears with disorder. With random defects, the friction becomes insensitive to chain length, defect density, and substrate.
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页码:166103 / 1
页数:4
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