Fabrication of micro optical surface profiles by using gray scale masks

被引：31

作者：

Kley, EB ^{[1
]}

Thoma, F ^{[1
]}

Zeitner, UD ^{[1
]}

Wittig, L ^{[1
]}

Aagedal, H ^{[1
]}

机构：

[1] Univ Jena, Inst Appl Phys, D-07743 Jena, Germany

来源：

MINIATURIZED SYSTEMS WITH MICRO-OPTICS AND MICROMECHANICS III | 1998年 / 3276卷

关键词：

micro optics; diffractive optics; e-beam lithography; surface shaping; gray scale lithography;

D O I：

10.1117/12.302404

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The fabrication of surface profiles may become an interesting technology in the field of micro optics and micromachining. Recently, surface profiles are known and widely used in optics, especially in diffractive optics. In the last few years the demand on deep and arbitrarily shaped profiles increased drastically. Laser beam writing and e-beam writing are technologies suitable for the fabrication of such profiles, but only for a limited range elf profile depth. Photolithography is also able to realize surface profiles, much deeper profiles can be realized by combining of different technologies. In this paper we report about a strategy for arbitrary deep profile generation as well as results we achieved by using single and combined technologies of special gray scale masks (based on HEBS glass), e-beam lithography and photolithography.

引用

页码：254 / 262

页数：9