Densification of synthetic fused silica under ultraviolet irradiation

被引:25
作者
Seward, TP [1 ]
Smith, C [1 ]
Borrelli, NF [1 ]
Allan, DC [1 ]
机构
[1] Corning Inc, Glass & Glass Ceram Res, Corning, NY 14831 USA
关键词
D O I
10.1016/S0022-3093(97)00383-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Fused silica undergoes densification upon prolonged exposure to high energy radiation and explanations in terms of changes in the silica tetrahedral ring structure have been offered. Under laser irradiation, the densification is often less than 10 parts per million, necessitating sensitive optical techniques for its measurement. This paper reviews some of the key literature, with emphasis on recent studies involving 193 nm excimer laser irradiation, and presents recent evidence that the UV laser-induced densification involves optically-induced weakening of bonds, via a two-photon absorption process, and subsequent structural relaxation of the glass. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:407 / 414
页数:8
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