Surface relaxations in polymers

被引:155
作者
Liu, Y
Russell, TP [1 ]
Samant, MG
Stohr, J
Brown, HR
Cossy-Favre, A
Diaz, J
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] IBM Corp, Almaden Res Ctr, Div Res, San Jose, CA 95120 USA
[3] Univ Wollongong, BHP Inst Steel Proc, Wollongong, NSW 2522, Australia
[4] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
D O I
10.1021/ma970869a
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Near-edge X-ray absorption line structure, NEXAFS, spectroscopy was used to investigate the relaxations of polystyrene, a typical amorphous polymer, near a free surface after the imposition of a small deformation. Using synchrotron radiation, the NEXAFS dichroic ratio was determined for both the Auger and total electron yield processes as a function of temperature to determine the orientation of the polymer in the first 1 and 10 nm from the free surface, respectively. Complete relaxation of the polymer was not seen for temperatures less than the bulk glass transition temperature. No evidence of enhanced mobility at the free surface was found. A planar relaxation of the polymer was found in, the first nanometer from the free surface, whereas in the first 10 nm, the dominant relaxation was normal to the surface.
引用
收藏
页码:7768 / 7771
页数:4
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