Micromachined pixel arrays integrated with CMOS for infrared applications

被引：7

作者：

Cole, BE ^{[1
]}

Higashi, RE ^{[1
]}

Wood, RA ^{[1
]}

机构：

[1] Honeywell Technol Ctr, Plymouth 55441, Devon, England

来源：

2000 IEEE/LEOS INTERNATIONAL CONFERENCE ON OPTICAL MEMS | 2000年

关键词：

D O I：

10.1109/OMEMS.2000.879627

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

Large arrays of small micromachined structures with low thermal mass and low thermal-conductance supports are suspended above silicon CMOS substrates and operate as 1) sensitive uncooled IR cameras or 2) high-temperature IR projectors.

引用

页码：63 / 64

页数：2