CVD growth and field emission characteristics of nano-structured films composed of vertically standing and mutually intersecting nano-carbon sheets

被引：28

作者：

Wang, Jiayu ^{[1
]}

Ito, Toshimichi ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Elect Engn, Suita, Osaka 5650871, Japan

来源：

关键词：

nano-structures; plasma CVD; field emission; electrical properties characterization;

D O I：

10.1016/j.diamond.2006.11.046

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nano-structured films composed of rather flat nano-carbon sheets which roughly stood vertically on Si wafers and which intersected each other at large angles were grown by means of a high-power microwave-plasma chemical-vapour-deposition (MWPCVD) method. The structure of the fabricated films was investigated using scanning electron microscopes and Raman spectroscopy. Field emission (FE) currents obtained from these films reached 50 mA/cm(2) at a macroscopic electric field of 3.6 V/mu m. The observed FE characteristics were analyzed using a modified Fowler-Nordheim (F-N) equation where the field enhancement factor and effective emission area were treated as field-dependent parameters. It was found from the analysis that the vertically standing nano-carbon flat sheets had larger field enhancement factors and less FE areas, compared with those obtained for wrinkled namo-carbon sheets previously reported by the authors. It is suggested that the observed variations in the FE current without saturation behavior as a function of the macroscopic electric field can be explained in terms of an effective surface geometry phenomenon of the concerned films. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：589 / 593

页数：5

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