Plasma-enhanced chemical vapor deposition of zinc oxide at atmospheric pressure and low temperature

被引：92

作者：

Barankin, M. D. ^{[1
]}

Gonzalez, E., II ^{[1
]}

Ladwig, A. M. ^{[1
]}

Hicks, R. F. ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2007年 / 91卷 / 10期

关键词：

transparent-conducting oxide (TCO); Al/ZnO; PECVD;

D O I：

10.1016/j.solmat.2007.02.009

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

The plasma-enhanced chemical vapor deposition of aluminum-doped zinc oxide has been demonstrated for the first time at 800 Torr and under 250 degrees C. A film resistivity of 3 x 10(-2) Omega cm and a transparency of 95% from 375 to 2500nm was obtained for deposition at 20-mTorr diethylzinc, 1.0 Torr CO2, 799 Torr He, a TMAl/DEZn ratio of 1:100, 41 W/cm(3) RF power, and 225 degrees C. The average aluminum concentration in the ZnO film was 5.4 x 10(20) cm(-3). It was found that, while the growth rate did not change with substrate temperature, both the resistivity and optical absorption coefficient declined with increasing temperature. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：924 / 930

页数：7

共 15 条

[1] Chemically deposited zinc oxide thin film gas sensor
Chatterjee, AP
Mitra, P
Mukhopadhyay, AK
[J]. JOURNAL OF MATERIALS SCIENCE, 1999, 34 (17) : 4225 - 4231
[2] Coutts T. J., 1999, 195 M EL SOC, P1
[3] David T., 2005, VAC TECH COAT, V6, P40
[4] Resistivity of polycrystalline zinc oxide films: current status and physical limit
Ellmer, K
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (21) : 3097 - 3108
[5] PEN as substrate for new solar cell technologies
Fonrodona, M
Escarré, J
Villar, F
Soler, D
Asensi, JM
Bertomeu, J
Andreu, J
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2005, 89 (01) : 37 - 47
[6] Highly conductive/transparent ZnO:Al thin films deposited at room temperature by rf magnetron sputtering
Fortunato, E
Nunes, P
Marques, A
Costa, D
Aguas, H
Ferreira, I
Costa, MEV
Martins, R
[J]. ADVANCED MATERIALS FORUM I, 2002, 230-2 : 571 - 574
[7] Property control of expanding thermal plasma deposited textured zinc oxide with focus on thin film solar cell applications
Groenen, R
Löffler, J
Linden, JL
Schropp, REI
van de Sanden, MCM
[J]. THIN SOLID FILMS, 2005, 492 (1-2) : 298 - 306
[8] GRUBER T, 2005, PHYS STATUS SOLIDI B, V2, P841
[9] TEXTURED ALUMINUM-DOPED ZINC-OXIDE THIN-FILMS FROM ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR DEPOSITION
HU, JH
GORDON, RG
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 71 (02) : 880 - 890
[10] Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition
Li, BS
Liu, YC
Zhi, ZZ
Shen, DZ
Zhang, JY
Lu, YM
Fan, XW
Kong, XG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (05): : 1779 - 1783

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