A review of ionizing radiation effects in floating gate memories

被引:49
作者
Cellere, G [1 ]
Paccagnella, A [1 ]
机构
[1] Univ Padua, Dept Informat Engn, I-35100 Padua, Italy
关键词
MOS memory integrated circuits; radiation effects; semiconductor device reliability;
D O I
10.1109/TDMR.2004.836726
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of ionizing radiation on microelectronics are traditionally a concern for devices intended for the space use, but they are becoming important even at ground level. Ionizing radiation effects can be broadly divided in two classes: total ionizing dose (progressive buildup of defects) and single event effects (macroscopic result of a single microscopic event). In both cases, ionizing radiation can lead to severe degradation of device performance, possibly resulting in device failure. This work is a review of literature results concerning both classes of ionizing radiation-related phenomena on floating gate memories. Regardless of its nature, ionizing radiation impacts two aspects of the performance and reliability of floating gate memories: the functionality and the adherence to specifications of the control circuitry, and the degradation of stored information in the array itself.
引用
收藏
页码:359 / 370
页数:12
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