Growth of ultrathin nanostructured Ag films on Si(111) 7 x 7: a SPA-LEED study

被引：16

作者：

Moresco, F

Rocca, M

Hildebrandt, T

Henzler, M

机构：

[1] Univ Hannover, Inst Festkorperphys, D-30167 Hannover, Germany

[2] CNR, Ctr Fis Superfici Basse Temp, I-16146 Genoa, Italy

[3] INFM, Dipartimento Fis, I-16146 Genoa, Italy

来源：

SURFACE SCIENCE | 2000年 / 463卷 / 01期

关键词：

growth; low energy electron diffraction (LEED); silicon; silver; surface structure; morphology; roughness; and; topography;

D O I：

10.1016/S0039-6028(00)00536-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ultrathin Ag films grown on Si(lll) 7 x 7 at different temperatures have been studied by spot profile analysis of low energy electron diffraction (SPA-LEED). For a deposition temperature of 100 K the films consist of touching (111) oriented grains and are complete at a coverage of about 1 Ag monolayer. For deposition at room temperature, in contrast, the grains form separated islands. The grains show a rotational disorder of 6 degrees and are atomically flat, as the rms height variations are only 10% of the atomic Ag interlayer spacing. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：22 / 28

页数：7

共 15 条

[1] LOW-ENERGY ELECTRON-DIFFRACTION WITH ENERGY RESOLUTION [J].