The influence of time, temperature, and grain size on indentation creep in high-purity nanocrystalline and ultrafine grain copper

被引:210
作者
Zhang, K [1 ]
Weertman, JR
Eastman, JA
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
关键词
D O I
10.1063/1.1828213
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microhardness measurements have been carried out on high purity Cu samples with average grain sizes ranging from similar to10 to similar to200 nm, over temperatures from liquid nitrogen to ambient, and dwell-times of the indenter in the sample from 5 s to 39 h. The Vickers hardness diminishes approximately linearly with the logarithm of the dwell-time. At short dwell-times the hardness increases significantly with decreasing grain size and with decreasing temperature, but the influence of these variables substantially diminishes at longer times. Investigation by transmission electron microscopy shows that rapid grain growth under the indenter most likely is responsible for the strong and long-lasting indentation creep. (C) 2004 American Institute of Physics.
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页码:5197 / 5199
页数:3
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