Transport properties of LaTiO3+x films and heterostructures

被引：50

作者：

Schmehl, A

Lichtenberg, F

Bielefeldt, H

Mannhart, J

Schlom, DG

机构：

[1] Univ Augsburg, Ctr Elect Correlat & Magnetism, Inst Phys, D-86135 Augsburg, Germany

[2] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 82卷 / 18期

关键词：

D O I：

10.1063/1.1572960

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the transport properties of LaTiO3+epsilon and LaTiO3.5 films. The LaTiO3+epsilon samples show metallic transport and several samples exhibit a hysteretic drop of resistance during cooldown at similar to240 K. The ferroelectric LaTiO3.5 samples, grown in capacitor structures, have nonlinear, diode-like and hysteretic V(I) characteristics. Two charge-controlled transport regimes are found, which can be utilized for switching the devices between two voltage states. (C) 2003 American Institute of Physics.

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页码：3077 / 3079

页数：3

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