On the thermal stability of metal particles supported on a thin alumina film

被引:74
作者
Heemeier, M
Stempel, S
Shaikhutdinov, SK
Libuda, J
Bäumer, M
Oldman, RJ
Jackson, SD
Freund, HJ
机构
[1] Max Planck Gesell, Fritz Haber Inst, Chem Phys Abt, D-14195 Berlin, Germany
[2] ICT Technol, Runcorn WA7 4QD, Cheshire, England
[3] Univ Glasgow, Dept Chem, Glasgow G12 8QQ, Lanark, Scotland
关键词
palladium; rhodium; cobalt; aluminum oxide; carbon monoxide;
D O I
10.1016/S0039-6028(02)02404-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structure of metal (Co, Rh, Pd) particles deposited on a thin alumina film grown on a NiAl(1 1 0) substrate were studied as a function of annealing temperature. The results reveal at least three processes to occur upon heating: (a) rearrangement of metal atoms on the particle surface, (b) sintering of the particles, and (c) metal migration into the substrate. The latter process is probably mediated by the defect structure of the oxide film and dominates at higher temperatures. The thermal stability is found to be better for Co, which strongly interacts with the alumina support, as compared to Pd and Rh. Hydroxylation of the alumina film increases Pd and Rh dispersion and shifts processes (b) and (c) to higher temperatures, likely due to a stronger interaction of the metals with the hydroxylated film. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:103 / 110
页数:8
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