Broadband antireflection gratings for glass substrates fabricated by fast atom beam etching

被引:76
作者
Kanamori, Y
Kikuta, H
Hane, K
机构
[1] Tohoku Univ, Dept Mech & Precis Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
[2] Osaka Prefecture Univ, Coll Engn, Dept Mech Syst Engn, Sakai, Osaka 5998531, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2000年 / 39卷 / 7B期
关键词
subwavelength grating; antireflection; fast atom beam; glass; micromachining; RCWA;
D O I
10.1143/JJAP.39.L735
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricated a two-dimensional subwavelength-structured (SWS) surface on a glass substrate. The SWS surface was patterned by electron-beam lithography and etched by an SF6 fast atom beam. The SWS surface consisted of tapered gratings with a 150 nm period and a 150 nm deep groove. The reflectivity at wavelengths from 400 nm to 2000 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis. At wavelengths from 400 nm to 800 nm, the reflectivity of the glass surface decreased to 1% from the original value of 5% of the glass substrate. The reflectivity was also examined as a function of the incident angle by using He-Ne laser light.
引用
收藏
页码:L735 / L737
页数:3
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