Thermally assisted reversal of exchange biasing in NiO and FeMn based systems

被引：94

作者：

van der Heijden, PAA

Maas, TFMM

de Jonge, WJM

Kools, JCS

Roozeboom, F

van der Zaag, PJ

机构：

[1] Eindhoven Univ Technol, COBRA, Interuniv Res Inst, Dept Phys, NL-5600 MB Eindhoven, Netherlands

[2] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands

来源：

APPLIED PHYSICS LETTERS | 1998年 / 72卷 / 04期

关键词：

D O I：

10.1063/1.120795

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The stability of the exchange bias field H-eb has been studied for magnetron sputtered NiO/Ni66Co18Fe16 and Ni66Co18Fe16/FeMn bilayers. A forced antiparallel alignment of the ferromagnetic magnetization to H-eb results in a gradual decrease of H-eb, as a function of time for NiO as well as FeMn based samples. The observed decrease of H-eb increases with temperature and is interpreted as a thermally assisted reversal of magnetic domains in the antiferromagnetic layer. (C) 1998 American Institute of Physics.

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收藏

页码：492 / 494

页数：3

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