Induced nanoscale deformations in polymers using atomic force microscopy

被引:42
作者
Lyuksyutov, SF [1 ]
Paramonov, PB
Sharipov, RA
Sigalov, G
机构
[1] Univ Akron, Dept Phys, Akron, OH 44325 USA
[2] Univ Akron, Dept Polymer Engn, Akron, OH 44325 USA
[3] Bashkir State Univ, Dept Math, Ufa 450074, Russia
[4] Virginia Tech Univ, Dept Comp Sci, Blacksburg, VA 24061 USA
来源
PHYSICAL REVIEW B | 2004年 / 70卷 / 17期
关键词
D O I
10.1103/PhysRevB.70.174110
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
An exact analytical solution, based on the method of images, is obtained for the description of the electric field between an atomic force microscope (AFM) tip and a thin dielectric polymer film (30 nm thick) spin coated on a conductive substrate. Three different tip shapes are found to produce electrostatic pressure above the plasticity threshold in the polymers up to 50 MPa. It is shown experimentally that a strong nonuniform electric field (5x10(8)-5x10(9) V m(-1)) between the AFM tip and polymer substrate produces nanodeformations of two different kinds in planar polymer films. Nanostructures (lines and dots) 10-100 nm wide and 0.1-5 nm high are patterned in the polymer films by using two different experimental techniques. The first technique relies on electric breakdown in the film leading to polymer heating above the glass transition point followed by mass transport of softened polymer material towards the AFM tip. The second technique is believed to be associated with plastic deformation of the polymer surface at the nanoscale. In this case the nanostructures are experimentally patterned in the films with no external biasing of the AFM tip, and using only the motion of the tip. This suggests an additional nanomechanical approach for nanolithography in polymer films of arbitrary thickness.
引用
收藏
页码:1 / 8
页数:8
相关论文
共 20 条
[1]
Lithographically induced self-construction of polymer microstructures for resistless patterning [J].
Chou, SY ;
Zhuang, L ;
Guo, LJ .
APPLIED PHYSICS LETTERS, 1999, 75 (07) :1004-1006
[2]
Determination of elastic moduli of thin layers of soft material using the atomic force microscope [J].
Dimitriadis, EK ;
Horkay, F ;
Maresca, J ;
Kachar, B ;
Chadwick, RS .
BIOPHYSICAL JOURNAL, 2002, 82 (05) :2798-2810
[3]
Harper W.R., 1967, CONTACT FRICTIONAL E
[4]
Dynamical instability of thin liquid films between conducting media [J].
Herminghaus, S .
PHYSICAL REVIEW LETTERS, 1999, 83 (12) :2359-2361
[5]
Soft lithography: Harnessing the unstable [J].
Herminghaus, S .
NATURE MATERIALS, 2003, 2 (01) :11-12
[6]
MICROWEAR PROCESSES OF POLYMER SURFACES [J].
KANEKO, R ;
HAMADA, E .
WEAR, 1993, 162 (pt A) :370-377
[7]
ORIENTATIONAL ORDERING OF POLYMERS BY ATOMIC FORCE MICROSCOPE TIP-SURFACE INTERACTION [J].
LEUNG, OM ;
GOH, MC .
SCIENCE, 1992, 255 (5040) :64-66
[8]
Structure formation at the interface of liquid liquid bilayer in electric field [J].
Lin, ZQ ;
Kerle, T ;
Russell, TP ;
Schäffer, E ;
Steiner, U .
MACROMOLECULES, 2002, 35 (10) :3971-3976
[9]
Amplitude-modulated electrostatic nanolithography in polymers based on atomic force microscopy [J].
Lyuksyutov, SF ;
Paramonov, PB ;
Juhl, S ;
Vaia, RA .
APPLIED PHYSICS LETTERS, 2003, 83 (21) :4405-4407
[10]
Peculiarities of an anomalous electronic current during atomic force microscopy assisted nanolithography on n-type silicon [J].
Lyuksyutov, SF ;
Paramonov, PB ;
Dolog, I ;
Ralich, RM .
NANOTECHNOLOGY, 2003, 14 (07) :716-721