Fabrication of monodomain alumina pore arrays with an interpore distance smaller than the lattice constant of the imprint stamp

被引：109

作者：

Choi, J ^{[1
]}

Nielsch, K ^{[1
]}

Reiche, M ^{[1
]}

Wehrspohn, RB ^{[1
]}

Gösele, U ^{[1
]}

机构：

[1] Max Planck Inst Microstruct Phys, D-06120 Halle An Der Saale, Germany

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 02期

关键词：

D O I：

10.1116/1.1556397

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Large-area monodomain. porous alumina arrays with an interpore distance of 500 nm are fabricated by imprint lithography. A 4 in. imprint master fully compatible with silicon technology was developed, which allows imprint pressures as low as 5 kN/cm(2) for direct imprint on aluminum. Due to the self-ordering phenomenon of porous alumina growth, we were able to reduce the interpore distance of the pore array to 60% of the lattice constant of the master stamp. Three lithographically defined pores are sufficient to guide anodization of a new pore in the center. (C) 2003 American Vacuum Society.

引用

页码：763 / 766

页数：4

共 21 条

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